nav emailalert searchbtn searchbox tablepage yinyongbenwen piczone journalimg journalInfo searchdiv qikanlogo popupnotification paper paperNew
2024, 12, v.39 50-55
正硅酸甲酯制备的研究进展
基金项目(Foundation): 电子级磷酸多级耦合纯化关键技术研究(黔科合支撑[2023]一般408)
邮箱(Email):
DOI:
摘要:

国家对集成电路行业的投入引来电子级化学品的快速发展。正硅酸甲酯(TMOS)广泛应用于化工、光学玻璃、电子电气等诸多领域。介绍工业级与电子级TMOS的质量,概述工业级和电子级TMOS制备工艺研究进展,以期为电子级TMOS的制备工艺提供技术思路。

Abstract:

The national investment in the integrated circuit industry has led to rapid development in electronic grade chemicals. TMOS is widely used in various fields such as chemical, optical glass, electronic and electrical field. The quality of industrial grade and electronic grade TMOS are introduced, the research progress on industrial grade and electronic grade TMOS production are focused on,aiming to provide technical ideas for the preparation process of electronic grade TMOS.

参考文献

[1]易征然,魏勇,徐杰,等.一种增透镀膜液及一种增透光伏玻璃:CN117645835A[P]. 2024-03-05.YI Z R,WEI Y,XU J,et al. Anti-reflection coating solution and anti-reflection photovoltaic glass:CN117645835A[P].2024-03-05.

[2] CAO X Y,ZHANG Q G,ZHENG C Y,et al. A novel approach to coat silica on quantum dots:Forcing decomposition of tetraethyl orthosilicate in toluene at high temperature[J]. Journal of Alloys and Compounds,2020,817:152698.

[3]李毅超,宋志伟,郝磊,等. TMOS-DMDMS复合型SiO2气凝胶的透光-疏水-隔热-力学性能研究[J].华中科技大学学报(自然科学版),2024,52(8):139-145.LI Y C,SONG Z W,HAO L,et al. Study of light transmissionhydrophobicity-insulation-mechanical properties of TMOSDMDMS composite SiO2aerogel[J]. Journal of Huazhong University of Science and Technology(Natural Science Edition),2024,52(8):139-145.

[4] EBELMEN. Untersuchungenüber die Verbindungen der Bors?ure und Kiesels?ure mit Aether[J]. Justus Liebigs Annalen der Chemie,1846,57(3):319-355.

[5] KAPIAS T,GRIFFITHS R F,STEFANIDIS C. Spill behaviour using reactpool:Part II. Results for accidental releases of silicon tetrachloride(SiCl4)[J]. Journal of Hazardous Materials,2001,81(3):209-222.

[6] UKHTOMSKII V G,UTKIN O V,FROLOV A F,et al. Kinetic Investigation and A Mathematical-Model of Esterification of Tetrachlorosilane With Ethanol[J]. Journal of Applied Chemistry of the Ussr,1978,51(5):1072-1077.

[7]张兴毅,赵雄,万烨,等.电子级正硅酸乙酯制备技术研究进展[J].绿色矿冶,2023,39(4):55-60.ZHANG X Y, ZHAO X, WAN Y, et al. Advances in the Preparation Technology of Electronic Grade Ethyl Orthosilicate[J]. Sustainable Mining and Metallurgy,2023,39(4):55-60.

[8]郑怀礼,黄小红,何强,等.以TEOS为硅源的聚硅硫酸铁中铁的形态分布研究[J].光谱学与光谱分析,2008,28(3):543-546.ZHENG H L,HUANG X H,HE Q,et al. Study of ferric species distribution in polyferric silicate sulfate(PFSS)prepared from tetraethyl orthosilicate(TEOS)[J]. Spectroscopy and Spectral Analysis,2008,28(3):543-546.

[9] ROCHOW E G. Methyl silicate from silicon and methanol[J].Journal of the American Chemical Society,1948,70(6):2170-2171.

[10] ROCHOW E G. Preparation of tetramethyl silicate:US2473260[P]. 1949-06-14.

[11] WANG A L,ZHANG M M,YIN H B,et al. Direct reaction between silicon and methanol over Cu-based catalysts:investigation of active species and regeneration of CuCl catalyst[J]. RSC Advances,2018,8(34):19317-19325.

[12] SUZUKI E,AKIYAMA M,ONO Y. Direct transformation of silica into alkoxysilanes by gas-solid reactions[J]. Journal of the Chemical Society, Chemical Communications,1992(2):136-137.

[13] ONO Y, AKIYAMA M, SUZUKI E. Direct synthesis of tetraalkoxysilanes from silica by reaction with dialkyl carbonates[J]. Chemistry of Materials,1993,5(4):442-447.

[14] AKIYAMA M, SUZUKI E, ONO Y. Direct synthesis of tetramethoxysilane from rice hull ash by reaction with dimethyl carbonate[J]. Inorganica Chimica Acta,1993,207(2):259-261.

[15] SCHATTENMANN F J, LEWIS L N. Method for making tetraorganooxysilanes:US6288257[P]. 2001-09-11.

[16] LEWIS L N,SCHATTENMANN F J,JORDAN T M,et al.Reaction of silicate minerals to form tetramethoxysilane[J].Inorganic Chemistry,2002,41(9):2608-2615.

[17] KURUSU A, SHIMASAKI Y, UGAMURA S. Process for producing alkoxysilanes:EP1323722(A1)[P].2003-07-02.

[18] KOZHEVNIKOV I V,CHIBIRYAEV A M,MARTYANOV O N.One-pot synthesis of TMOS from SiO2-enriched minerals and supercritical MeOH in a flow reactor[J]. Chemical Engineering Journal,2021,426:131871.

[19] GRUNIGER A,ROHR R V P. Deposition of Si O2-like diffusion barriers on PET and paper by PECVD[J]. Surface&Coatings Technology,2003,174:1043-1047.

[20]吴传明,马吉全.一种电子级正硅酸甲酯的提纯方法及系统:CN117304220A[P]. 2023-12-29.WU C M, MA J Q. Purification method and system of electronic-grade methyl orthosilicate:CN117304220A[P].2023-12-29.

[21]郑艳梅,孙静茹,李清彪.一种电子级正硅酸甲酯的提纯方法:CN118239971A[P]. 2024-06-25.ZHENG Y M,SUN J R,LI Q B. A purification method for electronic-grade methyl orthosilicate:CN118239971A[P].2024-06-25.

[22] BERNHARD D D,BAUM T H,BENAC B L,et al. Chemical method for removal and analysis of boron impurities in tetraethylorthosilicate(TEOS):US6458984[P]. 2002-10-01.

[23] LAXMAN R K. Purification of organosilanes of group 13(IIIA)and 15(VA)impurities:US5902893[P]. 1999-05-11.

[24] MULLEE W H. Ion exchange purification of dielectric condensate precursor fluids and silicate esters such as tetraethylorthosilicate(TEOS):US6660875[P]. 2003-12-09.

[25]金向华,孙猛,王新喜,等.一种高纯正硅酸乙酯的生产方法及生产系统:CN109438495B[P]. 2023-05-26.JIN X H,SUN M,WANG X X,et al. Production method and production system of high-purity ethyl silicate:CN109438495B[P]. 2023-05-26.

[26] POTTS T M. Purified tetraethoxysilane and method of purifying:US5840953[P]. 1998-11-24.

[27]李禾禾,毛鸿超,董岐,等.一种高纯正硅酸乙酯的制备方法和生产系统:CN116903653B[P]. 2024-05-24.LI H H,MAO H C,DONG Q,et al. Preparation method and production system of high-purity ethyl silicate:CN116903653B[P]. 2024-05-24.

[28] XU M,SAYASANE T,GIRARD J. Purification of siliconcontaining materials:US2005054211[P]. 2005-03-10.

[29]赵顺,王天喜,孙刚,等.一种电子级正硅酸四乙酯的制备方法:CN103772424A[P]. 2014-05-07.ZHAO S,WANG T X,SUN G,et al. Preparation method of electronic grade tetraethyl orthosilicate:CN103772424A[P].2014-05-07.

基本信息:

DOI:

中图分类号:TQ264.1

引用信息:

[1]胡国涛,黄家兴,柳陈军等.正硅酸甲酯制备的研究进展[J].生态产业科学与磷氟工程,2024,39(12):50-55.

基金信息:

电子级磷酸多级耦合纯化关键技术研究(黔科合支撑[2023]一般408)

检 索 高级检索

引用

GB/T 7714-2015 格式引文
MLA格式引文
APA格式引文